01549nam a2200217Ia 45000010008000000030004000080050017000120080041000290200018000700280037000880400024001250820022001491000017001712450046001882600056002343000008002905000256002985040743005546500016012977000018013130001923OSt20190314163528.0170602s9999    xx            000 0 und d  a9788126532605  q2016bAllied Informatics, Jaipur  bEnglishaBSDUcBSDU  a621.381.52bMAY .  aMay, Gary S  0aFundamentals of Semiconductor Fabrication  bWiley India Pvt. Ltd. Indiaa New Delhic2016,c2004  a305  aFrom crystal growth to integrated devices and circuits, this new book offers a basic, up-to-date introduction to semiconductor fabrication technology, including both the theoretical and practical aspects of all major steps in the fabrication sequence.  aContents
·	Introduction.

·	Crystal Growth.

·	Silicon Oxidation.

·	Photolithography.

·	Etching.

·	Diffusion.

·	Ion Implantation.

·	Film Deposition.

·	Process Integration.

·	IC Manufacturing.

·	Future Trends and Challenges.

Appendix A: List of Symbols.

Appendix B: International System of Units (SI Units).

Appendix C: Unit Prefixes.

Appendix D: Greek Alphabet.

Appendix E: Physical Constants.

Appendix F: Properties of Si and GaAs at 300 K.

Appendix G: Some Properties of the Error Function.

Appendix H: Basic Kinetic Theory of Gases.

Appendix I: SUPREM Commands.

Appendix J: Running PROLITH.

Appendix K. Percentage Points of the t Distribution.

Appendix L: Percentage Points of the F Distribution.

Index.  aElectronics  a Sze, Simon M