000			01645nam a2200241Ia 4500
999			_c511 _d511
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003			OSt
005			20190314163528.0
008			170602s9999 xx 000 0 und d
020			_a9788126532605
028			_q2016 _bAllied Informatics, Jaipur
040			_bEnglish _aBSDU _cBSDU
082			_a621.381.52 _bMAY .
100			_aMay, Gary S
245		0	_aFundamentals of Semiconductor Fabrication
260			_bWiley India Pvt. Ltd. India _a New Delhi _c2016,c2004
300			_a305
500			_aFrom crystal growth to integrated devices and circuits, this new book offers a basic, up-to-date introduction to semiconductor fabrication technology, including both the theoretical and practical aspects of all major steps in the fabrication sequence.
504			_aContents · Introduction. · Crystal Growth. · Silicon Oxidation. · Photolithography. · Etching. · Diffusion. · Ion Implantation. · Film Deposition. · Process Integration. · IC Manufacturing. · Future Trends and Challenges. Appendix A: List of Symbols. Appendix B: International System of Units (SI Units). Appendix C: Unit Prefixes. Appendix D: Greek Alphabet. Appendix E: Physical Constants. Appendix F: Properties of Si and GaAs at 300 K. Appendix G: Some Properties of the Error Function. Appendix H: Basic Kinetic Theory of Gases. Appendix I: SUPREM Commands. Appendix J: Running PROLITH. Appendix K. Percentage Points of the t Distribution. Appendix L: Percentage Points of the F Distribution. Index.
650			_aElectronics
700			_a Sze, Simon M
942			_2ddc _cBK