From crystal growth to integrated devices and circuits, this new book offers a basic, up-to-date introduction to semiconductor fabrication technology, including both the theoretical and practical aspects of all major steps in the fabrication sequence.

Contents
· Introduction.

· Crystal Growth.

· Silicon Oxidation.

· Photolithography.

· Etching.

· Diffusion.

· Ion Implantation.

· Film Deposition.

· Process Integration.

· IC Manufacturing.

· Future Trends and Challenges.

Appendix A: List of Symbols.

Appendix B: International System of Units (SI Units).

Appendix C: Unit Prefixes.

Appendix D: Greek Alphabet.

Appendix E: Physical Constants.

Appendix F: Properties of Si and GaAs at 300 K.

Appendix G: Some Properties of the Error Function.

Appendix H: Basic Kinetic Theory of Gases.

Appendix I: SUPREM Commands.

Appendix J: Running PROLITH.

Appendix K. Percentage Points of the t Distribution.

Appendix L: Percentage Points of the F Distribution.

Index.